• Ceramic Holder Plate for CMP Polishing-1
  • Ceramic Holder Plate for CMP Polishing-2
  • Ceramic Holder Plate for CMP Polishing-1
  • Ceramic Holder Plate for CMP Polishing-2

Ceramic Holder Plate for CMP Polishing

  We could supply customers ceramic holder for CMP polishing with various outer diameter and thickness. This kind of table could be used for CMP polishing of 2, 3, 4, 5, 6 inch wafer.
 Spare parts of ceramic plates and ring for polishing can be made according to customer's requirements.

Product Details

 Product Features
1. High flatness and parallelism;
2. Compact and uniform micro-structure with high strength;
3. High wear resistance;
4. Less deformation;
5. Non-pollution of metallic ion;
6. High cost-effective.
 
Specification

 

Detailed Images


Previous:

Next:

    Related Products

Inquiry

  
×
Notice